Chinese Journal of Magnetic Resonance ›› 1987, Vol. 4 ›› Issue (1): 53-60.

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ESR STUDY OF ACTIVE RADICALS PRODUCED BY PHOTOLYSIS OF SUBSTITUTED ZIRCONOCENE AND HAFNOCENE DICHLORIDE COMPLEX COMPOUNDS

Ji Haixing1, Xu Guangzhi1, Chen Shoushan2, Liu Yiyin2   

  1. 1. Institute of Chemistry, Academia Sinica, Beijing;
    2. Institute of Elementry Organic Chemistry, Nankai University, Tianjin, China
  • Received:1986-09-12 Published:1987-03-05 Online:2018-01-22

Abstract: Active radicals produced by photolysis of substituted zirconocene dichloride complexes (RC5H4)2ZrCl2(R=H,CH3,C3H7,C4H9,C5,H11,C6H11) and hafnocene dichloride complexes(RC5H4)2HfCl2(R=CH3,C2H5, C3H7)were studied by combining spin trapping technique with ESR spectroscopy.The results show that the photolytic mechanisms of substituted zirconocene and hafnocene dichloride complexes are the same as those of titanocene dichloride complexes. In other words the primary process of photolysis is homolytic cleavage of the M-(RC5H4) (M=Ti, Zr, Hf)π bond. Only in the former case the free radicals RCpMCl2(M=Zr, Hf) can be trapped by PBN and ND.

Key words: Spin trapping technique, Zirconocene Complex, ESR